The research projects conducted in my research group focus on the development of materials and technologies to enable next generation monolithically integrated nanoscaled electronic sensors and systems. While projects include development of novel differential capacitive pressure and inertial sensors shown at right, the group has two primary areas of research: the development of quantum dot-based technologies to extend (or replace?) modern microelectronic technologies (above center); and the development of porous silicon based technologies to enable novel sensors and electronic devices and systems (above right and lower right). The SEM image in the upper left represents research exploring porous silicon processing to form a kinoform lens structure. The image in the lower right shows a completed porous silicon-based vapor calibration standard for the WIMS micro gas chromatograph system.

These programs have been funded through various grants from the National Science Foundation through our participation in the Engineering Research Center for Wireless Integrated Microsystems (EEC-9886866), the Defense Advanced Research Projects Agency through the Army Research Laboratory (DAAD17-03-C-0115), the State of Michigan Economic Development Corporation (06-1-P1-0283), among other funding sources.